Foshan Huate Gases Co., Ltd.
Keywords : NH3,Ar,AsH3,BCL3,BF3,n-C4H10,CO2,CO,COS,CL2,ClF3,D2,B2H6,CH2F2,Si2H8,C2H6,C2ClH5,C2H4,F2,GeH4,He,C2F6,H2,HBr,HCL,HF,HeSe,H2S,i-C4H10,C4H8,Kr,CH4,CH3F,Ne,N2,NO,N2O,NF3,O2,C4F8,C3F8,PH3,C3H8,C3H6,SiH4,SiCL4,SiF4,SO2,SF6,CHF3,WF6,CF4,Xe
Description : Air, Ammonia (NH3), Argon (Ar), Arsine (AsH3), Boron Trichloride (BCL3), Boron Trifluoride (BF3), n-Butane (n-C4H10), Carbon Dioxide (CO2), Carbon Monoxide (CO), Carbonyl Sulfide(COS), Chlorine (CL2), Chlorine Trifluoride (ClF3), Deuterium (D2), Diborane (B2H6), Difluoromethane(CH2F2), Disilane (Si2H8), Ethane(C2H6), Ethyl Chloride (C2ClH5), Ethylene(C2H4), Fluorine (F2), Germane (GeH4), Helium (He), Hexafluoroaethane (C2F6), Hydrogen (H2), Hydrogen Bromide (HBr), Hydrogen Chloride (HCL), Hydrogen Fluoride (HF), Hydrogen Selenide (HeSe), Hydrogen Sulfide(H2S), Isobutane (i-C4H10), Isobutylene (C4H8), Krypton (Kr), Methane (CH4), Methyl Fluoride (CH3F), Neon (Ne), Nitrogen (N2), Nitric Oxide (NO), Nitrous Oxide (N2O), Nitrogen Trifluoride(NF3), Oxygen (O2), Octafluorocyclobutane (C4F8), Perfluoropropane (C3F8), Phosphine (PH3), Propane (C3H8), Propylene (C3H6), Silane (SiH4), Silicon Tetrachloride (SiCL4), Silicon Tetrafluoride(SiF4), Sulfur Dioxide(SO2), Sulfur Hexafluoride(SF6), Trifluoromethane (CHF3), Tungsten Hexafluoride (WF6), Tetrafluoromethane(CF4), Xenon (Xe) |
